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LDPN-100/63AZF Plasma Lon Nitriding Furnace With Auxiliary Heating And High Frequency Power
Samy
LDPN-100/63AZF
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What is auxiliary heating?
ion nitriding furnaces, the heating of workpieces relies entirelyon the heat generated by the plasma bombarding the surface of the workpieces.This approach is "from the surface to the core".
The auxiliary heating system is a set of heating devices (usually resistanceheating rods or heating plates) independently installed in the vacuum furnace body.It can radiate heat the workpiece before, during or independently of the plasmastartup.
In simple terms, it is equivalent to installing an "electric furnace" inside theion nitriding furnace, achieving dual or independent heating of the workpiece.
Application：
As an effective steel and alloy surface strengthening technology, ion nitriding has been widely used in the industrial field. Ion nitriding is different from traditional gas nitriding. Ion nitriding is mainly used for surface normalizing, quenching and tempering and ion nitriding treatment of alloy structural steel, bearing steel, spring steel, die steel, tool steel and other materials.
LDPN-100/63AZFlasma lon Nitriding FurnaceWith Auxiliary heating and high frequency power
Main technical indicators：
| Model | LDPN-100/63AZF |
Output voltage | 0-1000V continuously adjustable |
Maximum output average current | 100A |
Pulse peak current | 115A |
Pulse frequency | 10KHz |
Furnace working volume | φ1000×1200mm |
| Treated maximum surface area | 10 m² |
Working temperature | 850℃ |
| Auxiliary heating power supply power | 63KWH |
Rated load | 1000KG |
Ultimate vacuum degree | ≤6.67Pa |
Pressure rise rate | ≤0.13Pa/min |
Vacuum to 20Pa time | ≤30min |
Arc extinguishing time | ≤15μs |
Temperature control accuracy | ±1°C |
Pressure control accuracy | ±1Pa |
| Process | automatic control |
Core Technological Features:
Auxiliary Heating System (Radiation Heating)
Funetion: An independent, internal heating system (typically using electricresistance elements) that provides radiant heat to the workload.
Purpose:Pre-heating & Baking: Pre-heats the workload to a set temperature (e.g.,300-400°C)before plasma ignition, effectively removing surface moisture andcontaminants to ensure a perfectly clean, arc-free process start.
Temperature Uniformity: Creates a consistent background thermal feld,eliminating temperature gradients between complex geometries (e.g., deep holes vs.sharp edges) and ensuring uniform case depth.
Independent Control: Decouples the heating function from the plasma, allowingfor precise low-temperature processes and faster cycle times.
High-Frequency Pulse Power
FunetionFunction: Replaces or enhances traditional DC power with a high-frequencyswitched power supply. This modulates the plasma discharge at very highfrequencies (kHz range).
Purpose:
Stable & Dense Plasma: The rapid pulsing creates an exceptionally stable, dense,and uniform plasma cloud, even in deep bore holes, blind cavities, and aroundintricate part geometries.
Superior Are Suppression: High-frequency switching offers instantaneous arccontrol and suppression, reacting to micro-arcs within microseconds to prevent anysurface damage to sensitive components.
Enhanced Plasma Chemistry: Promotes more efcient ionization of the processgases, leading to a more active nitriding environment and potentially fasternitriding kinetics.
LDPN-100/63AZFlasma lon Nitriding FurnaceWith Auxiliary heating and high frequency power configuration table
Name | Specification introduce | Qty |
Vacuum furnace body | Chamber size：φ1000×1200mmH | 1 |
Vacuum pump | 2X-15 | 2 |
Electric vacuum butterfly valve | China GI-50 | 2 |
Vacuum solenoid valve | China DDC-JQ50 | 2 |
Mass flow controller | China D07 | 3 |
Film type absolute pressure vacuum gauge | China ZJ-1C | 1 |
Pressure control | Japan SR3 | 1 |
Temperature control | Japan SRS13 | 4 |
Rectifier transformer | China (25KVA oil-immersed) | 3 |
PLC(Programmable controller) | Mitsubishi FX series from Japan | 1 |
Industrial PC | 15＂ color touch-able display | 1 |
Equipment lifting device | Effective stroke 1000MM(hydraulic lifting) | 1 |
| Transformer | 120kVA | 1 |
| Auxiliary heating transformer | 80KVA | 1 |
| Auxiliary heating output voltage | 0-110V | 1 |
| Auxiliary heating output current | 200A | 1 |
Cooling tower (tank) | Flow ≥2M3/h | 1 |
LDPN-100/63AZF Plasma lon Nitriding FurnaceWith Auxiliary heating and high frequency power Selection and Function
Model | LDPN-100/63AF | LDPN-100/63AZF |
Chamber size | ¢1000x1200mm | ¢1000x1200mm |
Heating power（kw） | 100 | 100 |
Limited vacuum（Pa） | ≤6.7 | ≤6.7 |
Rising rate（Pa/min） | ≤0.13Pa | ≤0.13Pa |
Max loading（kg） | 1000 | 1000 |
Treated maximum surface area | 10㎡ | 10㎡ |
Normal operating temperature(℃) | 800±50 | |
Maximum operating temperature(℃) | ≤850 | |
Maximum peak current(A) | 115 | |
| Maximum output voltage(V) | 0-1000V Continuously adjustable | |
Frequency(Hz) | 1000 | 1000 |
Control mode | Fixed frequency width adjustment | |
Output waveform | Rectangular square wave | |
Arc Speed | ≤15μs | |
Temperature control mode | PID Automatic control | |
Pressure control mode | PID Automatic control | |
Pressure sensor type | Absolute pressure transmitte | |
Flow control mode | PID Automatic control | |
Ammonia flow-meter type | Mass flow-meter | |
| Carbon flow-meter type | Mass flow-meter | |
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